processing compatibility meaning in Chinese

工艺兼容性

Compared to other commonly referenced high - k materials , hfo2 is known for its stability on silicon and process compatibility . the fabrication and electrical properties of hfo2 and hfoxny gate are carefully studied . with the study on hfo2 . we can receive a few significative conclusion : 1
结果表明，与传统的hf清洗的si表面相比， nh _ 4f清洗的si表面与hfo _ 2具有更好的热力学稳定性，因而可获得更低的eot和栅泄漏电流密度； 3 )研究了溅射气氛和退火工艺对hfo _ 2栅介质薄膜性质的影响。